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Thin film deposition system
Thin film deposition system
HVM Flexilab
- Manufacturer: HVM Plasma spol s.r.o., Czech Republic
- Devices: 2
- Sputtering sources: up to 3
- Target: circular 2"
- Power supply: 3x DC, 1x p-DC, 1x RF, optional HiPIMS
- Deposition temperature: 20°C - 600°C
- Base pressure: 2E-5 Pa
- Additional infofmation: fully automated control system