prof. Petr Vašina, Ph. D.

Professor (Plasma Physics), Director of the DPPT, Head of the Research Program of the CEPLANT RD Center.

Employees

doc. Pavel Souček, Ph.D.

Associate Professor

Research and development of new types of materials, analysis of deposition process, preparation and analysis of coating for industrial partners

doc. Jaroslav Hnilica, Ph.D.

Associate Professor

Space and time resolved diagostics of plasma. Study of plasma instabilities.

Peter Klein, Ph.D.

Researcher

HiPIMS plasma diagnostic (OES, high-speed cameras, probes)

Pavel Ondračka, Ph.D.

Researcher

Ab-initio calculations of coating structure and properties

Richard Gaetan Paul Drevet, Ph.D.

Researcher

Preparation and analysis of ceramic coatings

Jaroslav Ženíšek, Ph.D.

Researcher

Ab-initio calculations of coating structure and properties

Matej Fekete, Ph.D.

Researcher

Research and development of new types of materials, diagnostics of the deposition process.

Tereza Schmidtová, Ph.D.

Researcher
Preparation and analysis of protective coatings

Students

Sahand Behrangi, M.Sc.

Ph.D. student
Industrial deposition and characterization of ternary nitride thin films

Mgr. Martin Ondryáš

Ph.D. student
Comprehending the multipulse HiPIMS process, synthesis and characterisation of deposited coatings

Mgr. Tomáš Rada

Ph.D. student
Industrial deposition of thin films in conditions of enhanced sputtered species ionisation

Mgr. Martin Učík

Ph.D. student

Deposition process based on pulsed arc synchronised with substrate bias for deposition of AlTiN and AlCrN coatings.

Mgr. Lukáš Vrána

Ph.D. student
Investigation of high entropy stabilised nitrides prepared by magnetron sputtering

Bc. Terézia Halamová

master student

Effect of spokes on thin film deposition

Bc. Tatiana Pitoňáková

master student

Simona Adameová

bachelor student

Comparison of models for reactive magnetron sputtering

Gergely Lelovics

bachelor student

Adam Vyžďura

bachelor student

Determination of the absolute number density of sputtered species during the magnetron sputtering process

Jan Zbožínek

bachelor student

Characterization of transition metal aluminium oxynitride thin films