prof. Petr Vašina, Ph. D.
Professor (Plasma Physics), Director of the DPPT, Head of the Research Program of the CEPLANT RD Center.
Employees
doc. Pavel Souček, Ph.D.
Associate Professor
Research and development of new types of materials, analysis of deposition process, preparation and analysis of coating for industrial partners
doc. Jaroslav Hnilica, Ph.D.
Associate Professor
Space and time resolved diagostics of plasma. Study of plasma instabilities.
Peter Klein, Ph.D.
Researcher
HiPIMS plasma diagnostic (OES, high-speed cameras, probes)
Pavel Ondračka, Ph.D.
Researcher
Ab-initio calculations of coating structure and properties
Richard Gaetan Paul Drevet, Ph.D.
Researcher
Preparation and analysis of ceramic coatings
Jaroslav Ženíšek, Ph.D.
Researcher
Ab-initio calculations of coating structure and properties
Matej Fekete, Ph.D.
Researcher
Research and development of new types of materials, diagnostics of the deposition process.
Tereza Schmidtová, Ph.D.
Researcher
Preparation and analysis of protective coatings
Students
Sahand Behrangi, M.Sc.
Ph.D. student
Industrial deposition and characterization of ternary nitride thin films
Mgr. Martin Ondryáš
Ph.D. student
Comprehending the multipulse HiPIMS process, synthesis and characterisation of deposited coatings
Mgr. Tomáš Rada
Ph.D. student
Industrial deposition of thin films in conditions of enhanced sputtered species ionisation
Mgr. Martin Učík
Ph.D. student
Deposition process based on pulsed arc synchronised with substrate bias for deposition of AlTiN and AlCrN coatings.
Mgr. Lukáš Vrána
Ph.D. student
Investigation of high entropy stabilised nitrides prepared by magnetron sputtering
Bc. Terézia Halamová
master student
Effect of spokes on thin film deposition
Bc. Tatiana Pitoňáková
master student
Simona Adameová
bachelor student
Comparison of models for reactive magnetron sputtering
Gergely Lelovics
bachelor student
Adam Vyžďura
bachelor student
Determination of the absolute number density of sputtered species during the magnetron sputtering process
Jan Zbožínek
bachelor student
Characterization of transition metal aluminium oxynitride thin films