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Thin film deposition system
Vinci Technologies PVD 50S
- Manufacturer: Vinci Technologies, France
- Sputtering sources: 4
- Targets: Cu, W, B4C, C, ...
- Power supply: 2x DC, 2x RF, 2x p-DC
- Deposition temperature: 20 °C - 750 °C
- Base pressure: 1E-4 Pa
- Additional infofmation: Load-Lock, MOS (in-situ stress measurement)