New publication in Vacuum

The article titled Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications was published in Vacuum journal. The study was done in collaboration with HVM Plasma, Prague, and the HUN-REN Centre for Energy Research, Budapest. It deals with aluminum tantalum oxide films for dielectric applications.

A list of our other publications can be found here.